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R&D is a key activity of JIPELEC strategy in order to provide RTP and CVD tools for semiconductors, micro-systems, photovoltaic applications and future materials. The main projects are:
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- New RTP and CVD equipments
- Innovative furnace for RTP and CVD on silicon carbide wafers
- Liquid delivery and evaporation systems for MOCVD processes
- MOCVD equipment for deposition of YBCO layers
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Jipelec Liquid Delivery System:
The innovative injection liquid delivery and evaporation system is one of the key projects for MOCVD range of products. In addition JIPELEC is preparing new liquid delivery and evaporation systems and dedicated tools for superconductors applications.
Silicon Carbide RTP and CVD
The SiC furnace is an annealing system for RTA of 50 mm diameter silicon carbide wafers up to 2000°C. In order to meet the road map for SiC wafers JIPELEC is now preparing the next generation of RTP and CVD furnaces for silicon carbide wafers up to 150 mm.
European Project: Brite Euram READY (1998-2002)
The project goal is to produce 60 m long supra conductive tapes. The demonstrator will be a voltage transformer. JIPELEC task in this project is the design and construction of equipment able to provide super-conductive tapes by high growth rate MOCVD process.
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| Partners: |
- Oxford Instruments (Great Britain)
- Air Liquide (France)
- Schneider (France)
- Plansee (Germany)
- LMGP (France)
- IOPW (Germany)
- IFW (Germany)
- BICC Cables (Great Britain)
- Theva (Germany)
- JIPELEC
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European Project: TOPS (2000-2002)
The objective is to develop a basic lab-scale excimer lamp assisted Ultraviolet Injection Liquid Source CVD (UVILS-CVD) process for tantalum pentoxide. JIPELEC will design and built a 200-mm process equipment inside the frame of this project.
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| Partners: |
- NMRC (Ireland)
- LMGP (France)
- UCL (Great Britain)
- Inorgtech (Great Britain)
- JIPELEC
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European Project: FLASH (2002-2004)
The project goal is to develop an adapted large area RTP equipment for solar cell production conditions (low-cost, high throughput). The equipment will be adapted for the following process sequences:
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- RTD - Rapid Thermal Diffusion of dopants
- RTO - Rapid Thermal Oxidation
- RTF - Rapid Thermal Firing of screenprinted contacts
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The general objective is to reach a throughput of 1 cell/second, which means a overall energy production of up to 30 Mwp/year.
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| Partners: |
- FhG-ISE (Germany)
- ACR (Germany)
- CEA-GENEC (France)
- RWE-Solar (Germany)
- Eurosolare (Italy)
- JIPELEC
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