Jipelec - Furnaces and thin Film Deposition
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LPCVD Mini-batch system
Stress-Free Silicon-rich Nitride Thin Films
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The Jipelec TubeStar furnace is a low cost tubular furnace for thermal and LPCVD processes. The system has high vacuum and gas mixing capabilities.

Temperature measurement and control system allows accurate and repeatable thermal behavior from low to high temperature.

The TubeStar furnace is equipped with the Jipelec PIMS PC control for recipes edition, data monitoring and data storage.

The Jipelec TubeStar has been specially developed to meet the requirements of pilot and low volume production. The design and the budget make it suitable for universities and research laboratories.
Applications: LPCVD processes
Stress-free silicon-rich nitride
Annealing
Oxidation
Diffusion
Features: Up to 200 mm wafers
Multi zones temperature control
Atmospheric & vacuum process capability
One purge gas line
Up to 6 gas lines with MFC
PC control
Vacuum valve and vacuum gauge
Performance:
Temperature range: up to 1200°C
Optional features: Vacuum pump
Turbomolecular pumping unit


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