The PlasmaStar PECVD System is the dedicated tool for process development on PECVD SiN processes for solar cell applications. The SolarLab series handles up to four tubes, with vertical process chamber and manual or automatic loading of the graphite boat.

Features:		Cell size up to 156x156 mm and Ø200mm Three-zone, spike and profile temperature control Atmospheric and vacuum process capability Up to 8 gas lines with MFCs Horizontal laminar airflow for loading station Process management software

The QUALIFLOW PECVD design is a proven system of high performance and flexible hydrogenated direct plasma, Plasma Enhanced Chemical Vapor Deposition for deposition of silicon nitride Layers. With its in-situ Plasma Etch Cleaning of the graphite electrode it will reduce maintenance manpower and down-time.

Applications:		Solar applications PECVD MEMS VLSI Technology
Furnace:		Temperature range from 200°C up to 600°C PC control