The Jipelec JetStar has been specially developed to meet the requirements of research and development units and to transfer the developed process to production. This RTP tool has a manual loading for your process development or pilot production. It can be upgraded to an automatic cassette to cassette system allowing your process to move to production in the shortest time.

The multi zone control for enhanced temperature uniformity; the temperature measurement and the control system provide accurate and repeatable thermal behavior from low to high temperature. The extended temperature range, vacuum performances and gas mixing capability make it suitable for a large range of RTP and RTCVD processes.

Applications:		RTA: annealing, implant monitoring RTO: Rapid Thermal Oxidation RTN: Rapid Thermal Nitridation RTD: Rapid Thermal Diffusion from spin-on dopants Crystallization Contact Alloying RTCVD processes (Poly-Silicon, Silicon Nitride)
Features:		Up to 200 mm wafers Cold wall chamber technology Pyrometer and thermocouple temperature control One purge gas line Up to 3 gas lines with MFC High vacuum capability Atmospheric and vacuum process capability Vacuum valve and vacuum gauge PC control
Performance:		Temperature range: ambient to 1250°C Ramp rate: 1°C/s to 200°C/s Pyrometer control: 150°C to 1250°C
Optional features:		Turbomolecular pumping unit Loadlock