The Jipelec JetClip sg low temperature Rapid Thermal Annealing (RTA) system utilizes a high power ultraviolet source to assist densification and crystallization for sol-gel, MOD and CSD processes. When used for ferroelectric and high-k materials such as PZT, SBT and BST, post annealing temperature can be reduced, a requirement in new generation devices. The Jipelec JetClip sg is a SEMI-MESC compatible Low Temperature Rapid Thermal Processing cluster module for wafer sizes up to 200 mm diameter. The lamp furnace with its powerful electronics in association with the innovative pyrometer temperature measurement and the reactor design provide accurate temperature control, process uniformity and repeatable thermal behavior.

Jipelec PIMS PC control allows for full process monitoring, data acquisition and pyrometer calibration for a large range of substrates.

Robot handling unit and loadlock are available upon request. Stand alone systems can also be supplied.

Applications:		PZT: Sensors, MEMS Glass: optical waveguides SBT: FeRAM BST: DRAM
Features:		Up to 200 mm wafers Cold wall chamber technology Infrared halogen lamp furnace 222 nm Excimer lamps Pyrometer temperature control Atmospheric & vacuum process capability One purge gas line Up to 6 gas lines with MFC
Performance:		Temperature range: ambient to 1000°C Ramp rate: 1°C/s to 200°C/s Pyrometer control: 150°C to 1000°C