The Jipelec DuoVap evaporator^* allows liquid and solid precursors dissolved in carrier liquid (solvent) to be used for CVD and MOCVD processes. This innovative system, based on a fractionated vaporization, has been specially developed for:

• Low vapor pressure CVD precursors
• CVD processes where solvent presence is detrimental
  

In CVD processes, solutions are the best way to handle solid precursors. DuoVap allows to eliminate solvent vapors before evaporating the precursors.

Jipelec DuoVap is particularly well-adapted to avoid: Carbonates contamination when working at low pressure and high temperatures. Explosive regime when working oxidizing atmosphere close to atmospheric pressure. Applications: Mechanical coatings : Cr2O3, Fe2O3, ZrN, TiN, NbN Superconductors: YbaCuO Optical coatings : TiO2, Ta2O5, Y2O3, Sc2O3 Thermal coatings : CeO2, Y2O3, MgO, Al2O3, ZrO2, SiO2 Colossal magnetoresistant: BaFe12O19, LaMnO Piezoelectric: (Pb,Sr)(Zr,Ti)O3 Conductive membranes: La1-XSrXGa1-YMyO3 (M=Fe, Co, Ni); La1-XSrXMnO3, La1-XCaXMnO3 Transparent conductive oxides: ITOAnticorrosion, hard coating, etc. Performance: Liquid lines: up to 2 lines Liquid feeding rate: up to 50g/hr Temperature range: up to 300°C (*) Patent pending